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Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566 - MRS Proceedings
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Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566 - MRS Proceedings
This book brings together many of the active players in the field to focus on the interdisciplinary nature of these challenges. It reflects, to some extent, the role played by both academic institutions and multinational corporations in opening up the frontiers in the field of CMP for wider dissemination. Both experimental and theoretical contributions are included.
281 pages
| Mídia | Livros Hardcover Book (Livro com lombada e capa dura) |
| Lançado | 10 de fevereiro de 2000 |
| ISBN13 | 9781558994737 |
| Editoras | Materials Research Society |
| Páginas | 296 |
| Dimensões | 157 × 234 × 23 mm · 591 g |
| Idioma | Inglês |
| Editor | Babu, S. V. (Clarkson University, New York) |
| Editor | Danyluk, S. (Georgia Institute of Technology) |
| Editor | Krishnan, M. (IBM T J Watson Research Center, New York) |
| Editor | Tsujimura, M. |
